March 10, 2017

Co-deposition Reactive Sputter System

One of our workhorse R&D reactors. This system has an impressive list of capabilities:

  • Dual 10kW Pinnacle Plus Pulsed DC Supplies
  • Configurable deposition source lid
  • Substrate heating to >900C
  • Closed loop reactive gas flow control (optical and voltage)
  • Load locked process chamber
  • Substrate handling up to 6″ diameter
  • UHV chamber design (<7.5e-8 torr base pressure)