One of our workhorse R&D reactors. This system has an impressive list of capabilities:
- Dual 10kW Pinnacle Plus Pulsed DC Supplies
- Configurable deposition source lid
- Substrate heating to >900C
- Closed loop reactive gas flow control (optical and voltage)
- Load locked process chamber
- Substrate handling up to 6″ diameter
- UHV chamber design (<7.5e-8 torr base pressure)