High pressure MW plasma source
ECR plasma source
Two new types of microwave plasma sources are installed and operational. One type is a more traditional ECR (electron cyclotron resonance) and the other is a high pressure collisional source. Our first development plans include the growth of DLC (diamond-like carbon) and studying the surface activation of polymer webs. While these types of sources are not new, the point-like source design and independent tunability allows us to create a planar or linear array for processing large area substrates.